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Method, system, and storage medium for resolving coloring conflict in multi-patterning lithography
專利

Method, system, and storage medium for resolving coloring conflict in multi-patterning lithography

Wai-Kei Mak, Bo-Yang Chen, Chi-Chun Fang 和 Ting-Chi Wang
12/11/2019

摘要

APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTRICITY ELECTROGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES Holography Photography Physics
A method performed by at least one processor includes: accessing a layout of an integrated circuit (IC), where the layout includes a plurality of patterns in one or more layers of the layout; performing a coloring operation; forming a list comprising at least one uncolorable cell group (UCG) of the layout based on a result of the coloring operation, where each of the at least one UCG comprises at least one uncolorable cell; and performing a first refinement for each UCG on the list. The first refinement is performed through: performing a movement on at least one uncolorable cell of the UCG; determining whether the UCG is colorable; and refining the layout by accepting the movement and removing the UCG from the list in response to the UCG being determined to be colorable.

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詳細資料

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