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Method to deposit particles on charge storage apparatus with charge patterns and forming method for charge patterns
Patent

Method to deposit particles on charge storage apparatus with charge patterns and forming method for charge patterns

Gwo, Shangjr, Tseng, Hsien-Te, 果尚志 and 曾賢德
25/06/2009

Abstract

The present invention discloses a method to deposit particles on a charge storage apparatus with charge patterns and a forming method for charge patterns. The forming method for charge patterns includes providing the charge storage apparatus having an electrically conducting substrate and a charge storage media layer. The charge storage apparatus is disposed in a vacuum or an anhydrous environment. An electrode and the electrically conducting substrate are utilized to conduct a first voltage and a second voltage respectively to form an electric field. Charges are then stored into the charge storage media layer of the charge storage apparatus through the electric field and the charge patterns are then formed. Accordingly, particles are deposited on the charge pattern-defined areas.

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