Photoresist And Formation Method Thereof

Taiwan Semiconductor Manufacturing Company Ltd.; National Tsing Hua University; Jui-Hsiung Liu; Pin-Chia Liao; Ting-An Lin; Ting-An Shih; Yu-Fang Tseng; Burn-Jeng Lin; Tsai-Sheng Gau; Po-Hsiung Chen; Po-Wen Chiu

Photoresist And Formation Method Thereof

Taiwan Semiconductor Manufacturing Company Ltd., National Tsing Hua University, Jui-Hsiung Liu, Pin-Chia Liao, Ting-An Lin, Ting-An Shih, Yu-Fang Tseng, Burn-Jeng Lin, Tsai-Sheng Gau, Po-Hsiung Chen, …

21/04/2026

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: Photoresist And Formation Method Thereof
: Taiwan Semiconductor Manufacturing Company Ltd. (Patent applicant)
National Tsing Hua University (Patent applicant)
Jui-Hsiung Liu (Inventor)
Pin-Chia Liao (Inventor)
Ting-An Lin (Inventor)
Ting-An Shih (Inventor)
Yu-Fang Tseng (Inventor)
Burn-Jeng Lin (Inventor)
Tsai-Sheng Gau (Inventor)
Po-Hsiung Chen (Inventor)
Po-Wen Chiu (Inventor) - National Tsing Hua University, College of Semiconductor Research
: Patent
: US 12,607,929 B2
: 18/314,566
: 09/05/2023
: 21/04/2026
: 04/04/2024
: English
: 優先權US 202318314566 20230509; US 202263401896P 20220829