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Radiatively Cooling Substrate And Manufacturing Method Of The Same
Patent

Radiatively Cooling Substrate And Manufacturing Method Of The Same

National Tsing Hua University, 陳玉彬 and 韓宏笙
30/04/2020

Abstract

A radiative cooling substrate and a manufacturing method of the radiative cooling substrate are provided. The radiative cooling substrate includes a metallic substrate and a chitosan layer disposed on the metallic substrate with a thickness of 0.5 μm to 10 μm. The chitosan layer emits radiation within a waveband between 8 μm and 13 μm.

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