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Semiconductor Device And Fabrication Method Thereof
Patent

Semiconductor Device And Fabrication Method Thereof

Innoscience (Suzhou) Technology Co., Ltd., 黃敬源, LI, Hao and YAO, Weigang
24/11/2022

Abstract

A semiconductor device includes a drain electrode, a first source electrode, a second source electrode, a first gate electrode, and a second gate electrode. The first gate electrode is arranged between the first source electrode and the drain electrode. The first gate electrode extends along a first direction. The second gate electrode is arranged between the second source electrode and the drain electrode. The second gate electrode extends along the first direction. The first gate electrode is arranged above a first imaginary line substantially perpendicular to the first direction in a top view of the semiconductor device and the second gate electrode is arranged below a second imaginary line substantially perpendicular to the first direction in the top view of the semiconductor device.

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