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Transistor Having Metal Diffusion Barrier
Patent

Transistor Having Metal Diffusion Barrier

Taiwan Semiconductor Manufacturing Company Ltd., 黃敬源, Lin, Yu-Syuan, Yu, Jiun-Lei Jerry, Yao, Fu-Wei, Yu, Chen-Ju, Su, Ru-Yi, Chen, Po-Chih and Yang, Fu-Chih
29/01/2015

Abstract

A transistor includes a substrate, a channel layer over the substrate, an active layer over the channel layer, a metal diffusion barrier over the active layer, and a gate over the metal diffusion barrier. The active layer has a band gap discontinuity with the channel layer.

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