Abstract
A method of manufacturing hollow micro-needle structures includes the steps of: disposing a first mask layer and a second mask layer respectively at one side of a front surface of a first substrate and one side of a rear surface of the first substrate, wherein the first substrate is transparent to predetermined light; forming a photoresist layer on the front surface of the first substrate and the first mask layer; providing the predetermined light to illuminate the first substrate from the rear surface to the front surface of the first substrate so as to expose the photoresist layer to form an exposed portion and an unexposed portion; and removing the unexposed portion to form a micro-needle structure, which is formed by the exposed portion and has a inclined sidewall and a through hole surrounded by the inclined sidewall.