Abstract
The present invention provides a method for manufacturing optical micro-electromechanical device, which includes: providing a substrate; depositing an oxide layer on the substrate; performing plural etching on the substrate to form trenches with plural kinds of depths; depositing a first polysilicon layer to refill the trenches; depositing a first nitride layer and a second polysilicon layer on the refilled trenches; removing the first polysilicon layer; depositing a second nitride layer; and performing a bulk etching.