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具有極低折射率的抗反射構造及含有此構造的裝置
Patent

具有極低折射率的抗反射構造及含有此構造的裝置

國立清華大學, 果尚志, 佘銘軒, 陳虹穎, 薛涵宇 and 何榮銘
16/07/2012

Abstract

Nanoporous polymers with gyroid nanochannels can be fabricated from the self-assembly of degradable block copolymer, polystyrene-b-poly(L-lactide) (PS-PLLA), followed by the hydrolysis of PLLA blocks. A well-defined nanohybrid material with SiO2 gyroid nanostructure in a PS matrix can be obtained using the nanoporous PS as a template for the sol-gel reaction. After subsequent UV degradation of the PS matrix, a highly porous inorganic gyroid network remains, yielding a single-component material with an exceptionally low refractive index (as low as 1.1).

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