Abstract
The present invention discloses a method of dispatching semiconductor batch production. The method comprises following steps: By measuring the actual line width to statistic an estimated value of line width bias reference level, an estimated value of product bias, an estimated value of chamber bias and a standard error of chamber bias, than stored in an historical data module. Input a production batch data with a product category, a line width measurement before manufacturing and a target line width after manufacturing to a batch production module. According to the data of the historical data module, a computing engine of a matching module calculates a similarity index of every chamber. A dispatching module transforms the similarity index into a priority of machine allocation and dispatches the machine for batch production. Update the historical data module by measuring the line width after production. The line width bias generated by various variations will be eliminated during the manufacturing process.