Abstract
This invention relates to a manufacture method and structure for impression mold insert, which is applicable in nano-impression technique. The invention sequentially forms a diamond material layer and a photoresist layer on a substrate material, wherein the resist layer possesses much more etching-resistant than that of the diamond material. Thereafter, an energy beam micro-imaging technique is employed to cause the photoresist layer to form a photoresist mask of particularly-arranged pattern, and a dry etching process is directly performed on to the surface of the diamond material to easily form raised/recessed figures corresponding to the pattern of the resist mask by utilization of the difference between the etching selective ratios of the diamond material and the photoresist layer material, and completing an impression mold insert with diamond material as the main component. The structure for the mold insert not only possesses high grinding resistance, but also allow easy mold removal.