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多层膜结构
Patent

多层膜结构

葉均蔚 and 葉均蔚
11/05/2018

Abstract

The invention discloses a multilayer film structure. The multilayer film structure is formed by stacking high-entropy material film layers and non-high-entropy material film layers in an interaction manner. The multilayer film structure at least comprises the two high-entropy material film layers, and the total nanoindentation hardness of the multilayer film structure is at least 10 GPa. Due to the fact that film layers included in an existing multilayer film coating system all belong to non-high-entropy materials, material composition design of the multilayer film coating system is limited. On that account, the at least two high-entropy material film layers and the other non-high-entropy material film layers of the multilayer film structure are especially stacked, or the at least two high-entropy material film layers are stacked, and in this manner, the multilayer film structure capable of being arranged on the surface of a workpiece substrate in a plated manner is formed. Due to thefact that the multilayer film structure is provided with an interlayer interface capable of stopping crack expansion and strain deformation, the hardness and toughness of the surface of the workpiecesubstrate can be improved. In addition, by means of optic interference between the film layers, the multilayer film structure can generate different colors, and therefore the appearance color of the surface of the workpiece substrate is improved or changed.

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