Abstract
A nitrogen-based semiconductor device includes first and second nitrogen-based semiconductor layers, a source electrode, a gate electrode, and a drain structure. The drain structure includes a first doped nitrogen-based semiconductor layer, an ohmic contact electrode, and a conductive layer. The first doped nitrogen-based semiconductor layer is in contact with the second nitrogen-based semiconductor layer to form a first contact interface. The ohmic contact electrode is in contact with the second nitrogen-based semiconductor layer to form a second contact interface. The conductive layer includes a metal and is in contact with the second nitrogen-based semiconductor layer to form a metal-semiconductor junction therebetween. The conductive layer connects the first doped nitrogen-based semiconductor layer and the ohmic contact electrode, and the ohmic contact interface is farther from the gate electrode than the first contact interface and the second contact interface.