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浸入式傾斜微影機台及其浸入槽
Patent

浸入式傾斜微影機台及其浸入槽

國立交通大學, 曾繁根 and 洪國永
15/04/2010

Abstract

A tank for immersion inclined lithography technology is provided. A chase of the tank has a bottom and sidewalls enclosed tightly to form a container for liquid, wherein the refractive index of the liquid is between 1.4 and 1.6. A table is disposed in the container and immersed in the liquid. The table has an axis disposed on its side parallel to the bottom of the chase, wherein the axis passes through a hole penetrated the sidewall of the chase. A roller disposed near the hole outside the chase connects the axis to rotates the axis, and furthermore, incline the table accordingly.

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