Abstract
This invention provides a manufacturing process of polymer structure of microsphere and micrononsphere array by excimer laser using a photomask having a predetermined curve line pattern whose width is not constant along the direction of a straight line. The light of the excimer laser passes through the curve line pattern of the photomask and impacts the polymer material coated on a substrate to peel and etch the polymer material. The substrate moves along the direction perpendicular to the straight line during excimer laser emission to make the polymer material receive emission of different durations of time at different positions along the direction of the straight line and thus create different etching depths. Therefore, the polymer material is etched into a three-dimensional pattern of a predetermined shape. Moreover, through two times of emission etching of different directions or different photomask pattern, a micro array structure of quasi-sphere or nonsphere can be obtained.