Abstract
A thin film coating method includes a substrate, and a double blade slit coating apparatus is placed on the substrate, such that the coating material is coated on the substrate to form a thin film. The double blade slit coating apparatus equipped with a first blade, a second blade, and a feed tube, in which the nozzle of the feed tube is disposed between the first blade and the second blade, and the first blade and the second blade are disposed along the vertical direction of the substrate and are paralleled to the substrate. When the double blade slit coating apparatus is moved forward along the substrate in a vertical direction, the coating material is feed through the nozzle into the slit at the same time. When the coating material is coated on the substrate, the coating material is performed with a first flat process by the first blade and then is performed with a second flat process to the coating material by the second blade, such that the coating material is formed flat on the substrate. Finally, the coating material is repeated to form on the substrate until the coating material is coated on the substrate to form a thin film with a uniform thickness.