Logo image
高熵合金鍍膜方法
Patent   Open access

高熵合金鍍膜方法

國立清華大學 and 葉均蔚
16/06/2006

Abstract

A physical deposition method is disclosed, which includes one or more than one high-entropy alloy targets, and the coating on substrates with material layers that contain multi-principal elements. The high-entropy alloy targets comprise 5 to 11 principal metal elements, in which each principle metal element has a mole percentage between 5% and 35% of the whole alloy. The targets can be manufactured by melting and casting, wrought process or powder metallurgy.
pdf
高熵合金鍍膜方法.pdfDownloadView
Open Access

Related links

Metrics

1 Record Views

Details

Logo image