Effect of Nitrogen Flow Rate on Structure and Properties of Nanocrystalline TiN Thin Film by Unbalanced Magnetron Sputtering

Technical documentation

J.-H. Huang and Kiang-Wee Lau

Final report to the National Science Council ROC Final report to the National Science Council ROC

2003

Abstract

Nitrogen Flow Rate;Structure;Properties;Nanocrystalline TiN Thin Film;Unbalanced Magnetron Sputtering

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Title: Effect of Nitrogen Flow Rate on Structure and Properties of Nanocrystalline TiN Thin Film by Unbalanced Magnetron Sputtering
Creators - without role: J.-H. Huang - 國立清華大學原子科學院工程與系統科學系
Kiang-Wee Lau
Identifiers: 9957769364906774
Academic Unit: Department of Engineering and System Science, College of Nuclear Science, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Technical documentation
Publication Details: Final report to the National Science Council ROC Final report to the National Science Council ROC