Effect of Ti interlayer on residual stress and texture development of TiN thin films deposited by unbalanced magnetron sputtering

Technical documentation

J.-H. Huang and Tsan-Huang Wu

Final report to the National Science Council ROC Final report to the National Science Council ROC

2006

Abstract

Ti interlayer;residual stress;texture development;TiN thin films;unbalanced magnetron sputtering

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Title: Effect of Ti interlayer on residual stress and texture development of TiN thin films deposited by unbalanced magnetron sputtering
Creators - without role: J.-H. Huang - 國立清華大學原子科學院工程與系統科學系
Tsan-Huang Wu
Identifiers: 9957776340206774
Academic Unit: Department of Engineering and System Science, College of Nuclear Science, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Technical documentation
Publication Details: Final report to the National Science Council ROC Final report to the National Science Council ROC